Ellipsometry, single wavelength ellipsometry or spectroscopic ellipsometry, is a method to determine layer thickness and optical constants of thin films or substrates. An ellipsometer, either a single wavelength or a spectroscopic ellipsometer, measures the polarization change at reflection (or transmission in case of anisotropic sample).
We offer a wide range of spectroscopic ellipsometers, optimized for your particular application. The flexible ellipsometer VASE, based on a scanning monochromator is ideal for all kinds of R&D applications, covering the widest spectral range in the market from 140 to 3200 nm, or in combination with IR-VASE up to 30 µm. Alternatively, our fast CCD based, rotating compensator spectroscopic ellipsometers M-2000 and RC2 are available for ex-situ as well as in-situ applications.
What is Ellipsometry?
This brief introduction to ellipsometry is targeted to the novice and provides a fundamental description of ellipsometry measurements and typical data analysis procedures. The primary applications of ellipsometry are also covered.
The iSE is a new in-situ spectroscopic ellipsometer developed for real-time monitoring of thin film processing. Using our proven technology, the iSE enables users to optimize optical properties of deposited films, control film growth with sub-angstrom sensitivity, and monitor growth kinetics.
The M-2000 ellipsometer combines highly accurate 'rotating compensator' method with fast CCD technology. This allows high speed measurements: min. 390 wavelengths in < 1 second. It is available as ex-situ and in-situ setup.
The RC2 is the first spectroscopic ellipsometer with two rotating compensators. It combines the best features of previous instruments with innovative new technology: dual rotating compensator, achromatic compensator design, advanced light source and next-generation spectrometer design. The RC2 is a near-universal solution for the diverse applications of spectroscopic ellipsometry and Mueller matrix ellipsometry.
Spectroscopic ellipsometer Alpha-SE is a fast, low-cost system for measuring film thickness and optical constants. Everything is contained in an amazingly small package. It is the ideal table top tool. It is computer controlled through an USB port.
The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical characterization of materials used in lithography applications. Its measurement range spans vacuum ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous types of materials: semiconductors, dielectrics, polymers, metals, multilayers and now liquids such as immersion fluids.
The IR-VASE is the first and only spectroscopic ellipsometer to cover the spectral range from 1.7 to 30 microns (333 to 5900 wavenumbers). The IR-VASE can determine both n and k for materials over the entire width of the spectral range without extrapolating data outside the measured range, as with a Kramers-Kronig analysis. Like other Woollam ellipsometers, the IR-VASE is perfect for thin films or bulk materials including dielectrics, semiconductors, polymers and metals.